Reaction paths of phosphine dissociation on silicon (001)

- Warschkow, O., Curson, N. J., Schofield, S. R., Marks, N. A., Wilson, H. F., Radny, M. W., Smith, P. V., Reusch, T. C. G., McKenzie, D. R., Simmons, M. Y.

Interface and nanostructure evolution of cobalt germanides on Ge(001)

- Grzela, T., Koczorowski, W., Capellini, G., Czajka, R., Radny, M. W., Curson, N., Schofield, S. R., Schubert, M. A., Schroeder, T.

An in situ STM/AFM and impedance spectroscopy study of the extremely pure 1-butyl-1-methylpyrrolidinium tris(pentafluoroethyl)trifluorophosphate/Au(111) interface: potential dependent solvation layers and the herringbone reconstruction

- Atkin, Rob, Borisenko, Natalia, Druschler, Marcel, El Abedin, Sherif Zein, Endres, Frank, Hayes, Robert, Huber, Benedikt, Roling, Bernhard

AFM and STM studies on the surface interaction of (BMP)TFSA and (EMIm)TFSA ionic liquids with Au(111)

- Atkin, Rob, El Abedin, Sherif Zein, Hayes, Robert, Gasparotto, Luiz H. S., Borisenko, Natalia, Endres, Frank

Interaction of acetone with the Si(0 0 1) surface

- Saraireh, S. A., Smith, P. V., Radny, M. W., Schofield, S. R., King, B. V.

Invited review article: accurate and fast nanopositioning with piezoelectric tube scanners: emerging trends and future challenges

- Moheimani, S. O. Reza

Valence surface electronic states on Ge(001)

- Radny, M. W., Shah, G. A., Schofield, S. R., Smith, P. V., Curson, N. J.

Water on silicon (001): C defects and initial steps of surface oxidation

- Warschkow, O., Schofield, S. R., Marks, N. A., Radny, M. W., Smith, P. V., McKenzie, D. R.

Towards hybrid silicon-organic molecular electronics: the stability of acetone on the Si(0 0 1) surface

- Saraireh, S. A., Schofield, S. R., Smith, P. V., Radny, M. W., King, B. V.

Phosphine dissociation and diffusion on Si(001) observed at the atomic scale

- Schofield, Steven R., Curson, Neil J., Warschkow, Oliver, Marks, Nigel A., Wilson, Hugh F., Simmons, Michelle Y., Smith, Phillip V., Radny, Marian W., McKenzie, David R., Clark, Robert G.

Scanning probe microscopy for silicon device fabrication

- Simmons, M. Y., Ruess, F. J., Reusch, T. C. G., Goh, K. E. J., Hallam, T., Schofield, S. R., Oberbeck, L., Curson, N. J., Hamilton, A. R., Butcher, M. J., Clark, R. G.